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Hexagonal nanostructures generated by light masks for neutral atoms

Authors :
Tilman Pfau
J. Mlynek
M. Drewsen
Th. Schulze
U. Drodofsky
J. Stuhler
B. Brezger
Source :
Applied Physics B: Lasers and Optics. 65:755-759
Publication Year :
1997
Publisher :
Springer Science and Business Media LLC, 1997.

Abstract

Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed.

Details

ISSN :
14320649 and 09462171
Volume :
65
Database :
OpenAIRE
Journal :
Applied Physics B: Lasers and Optics
Accession number :
edsair.doi...........a4f501856459eccc970348f4bf2c2613