Separable OPC models for computational lithography

MLA

Hua-yu Liu, et al. “Separable OPC Models for Computational Lithography.” SPIE Proceedings, May 2008. EBSCOhost, https://doi.org/10.1117/12.793039.

APA

Hua-yu Liu, J. Fung Chen, Yu Cao, Jiong Jiang, Hua Cao, Eelco van Setten, Geert Vandenberghe, Robert John Socha, Lieve Van Look, Wenjin Shao, Mu Feng, Michael Crouse, Andre Engelen, Jo Finders, Jeroen Meessen, Joost Bekaert, & Qian Zhao. (2008). Separable OPC models for computational lithography. SPIE Proceedings. https://doi.org/10.1117/12.793039

Chicago

Hua-yu Liu, J. Fung Chen, Yu Cao, Jiong Jiang, Hua Cao, Eelco van Setten, Geert Vandenberghe, et al. 2008. “Separable OPC Models for Computational Lithography.” SPIE Proceedings, May. doi:10.1117/12.793039.