Nanostructure fabrication using lithium fluoride films as an electron beam resist

MLA

W. Langheinrich, et al. “Nanostructure Fabrication Using Lithium Fluoride Films as an Electron Beam Resist.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 10, Nov. 1992, p. 2868. EBSCOhost, https://doi.org/10.1116/1.585976.

APA

W. Langheinrich, B. Spangenberg, & H. Beneking. (1992). Nanostructure fabrication using lithium fluoride films as an electron beam resist. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 10, 2868. https://doi.org/10.1116/1.585976

Chicago

W. Langheinrich, B. Spangenberg, and H. Beneking. 1992. “Nanostructure Fabrication Using Lithium Fluoride Films as an Electron Beam Resist.” Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 10 (November): 2868. doi:10.1116/1.585976.