Localized planarization of optical damage using laser-based chemical vapor deposition

We present a method to repair damaged optics using laser-based chemical vapor deposition (L-CVD). A CO 2 laser is used to heat damaged silica regions and polymerize a gas precursor to form SiO 2 . Measured deposition rates and morphologies agree well with finite element modeling of a two-phase reaction. Along with optimizing deposition rates and morphology, we also show that the deposited silica is structurally identical to high-grade silica substrate and possesses high UV laser damage thresholds. Successful application of such a method could reduce processing costs, extend optic lifetime, and lead to more damage resistant laser optics used in high power applications.