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Damaging Effect of Low Energy N+Implantation on Aspergillus niger Spores

Authors :
Cheng Mao-ji
Yu Zengliang
Wang Lisheng
Zhang Shuqing
Chen Lijuan
Cai Kezhou
Liu Xuelan
Source :
Plasma Science and Technology. 9:307-311
Publication Year :
2007
Publisher :
IOP Publishing, 2007.

Abstract

The mutant effects of a keV range nitrogen ion (N+) beam on enzyme-producing probiotics were studied, particularly with regard to the induction in the genome. The electron spin resonance (ESR) results showed that the signal of ESR spectrum existed in both implanted and non-implanted spores, and the yields of free radicals increased in a dose-dependent manner. The ionic etching and dilapidation of cell wall could be observed distinctly through the scanning electron microscope (SEM). The mutagenic effect on genome indicated that N+ implantation could make base mutation. This study provided an insight into the roles low-energy ions might play in inducing mutagenesis of micro-organisms.

Details

ISSN :
10090630
Volume :
9
Database :
OpenAIRE
Journal :
Plasma Science and Technology
Accession number :
edsair.doi...........a2810282ab216d83d3b60d42a4f402f8