Deposition of carbon nitride films by an electron-beam-excited plasma sputtering method

MLA

Masahito Ban, et al. “Deposition of Carbon Nitride Films by an Electron-Beam-Excited Plasma Sputtering Method.” Surface and Coatings Technology, June 2003, pp. 332–35. EBSCOhost, https://doi.org/10.1016/s0257-8972(03)00094-x.

APA

Masahito Ban, Akiko Goto, Yozo Kakudate, Yoshinori Dake, & Takeshi Hasegawa. (2003). Deposition of carbon nitride films by an electron-beam-excited plasma sputtering method. Surface and Coatings Technology, 332–335. https://doi.org/10.1016/s0257-8972(03)00094-x

Chicago

Masahito Ban, Akiko Goto, Yozo Kakudate, Yoshinori Dake, and Takeshi Hasegawa. 2003. “Deposition of Carbon Nitride Films by an Electron-Beam-Excited Plasma Sputtering Method.” Surface and Coatings Technology, June, 332–35. doi:10.1016/s0257-8972(03)00094-x.