GAP OPTIMISATION FOR PROXIMITY X-RAY LITHOGRAPHY USING THE SUPER-RESOLUTION PROCESS

MLA

Herbert O. Moser, et al. “Gap Optimisation for Proximity X-Ray Lithography Using the Super-Resolution Process.” International Journal of Computational Engineering Science, Sept. 2003, pp. 585–88. EBSCOhost, https://doi.org/10.1142/s1465876303001812.

APA

Herbert O. Moser, Jong Ren Kong, & O. Wilhelmi. (2003). Gap Optimisation for Proximity X-Ray Lithography Using the Super-Resolution Process. International Journal of Computational Engineering Science, 585–588. https://doi.org/10.1142/s1465876303001812

Chicago

Herbert O. Moser, Jong Ren Kong, and O. Wilhelmi. 2003. “Gap Optimisation for Proximity X-Ray Lithography Using the Super-Resolution Process.” International Journal of Computational Engineering Science, September, 585–88. doi:10.1142/s1465876303001812.