Metal oxides and metal thin films by atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction methods for THR applications

This chapter discusses the fundamentals and application of atomic layer deposition (ALD), liquid-ALD, and successive ionic layer adsorption and reaction (SILAR) methods for producing thin films that can be engineered for transparent heat regulations (THR). The thin film materials include metals and metal oxides while their surface morphological and electronic properties have been discussed with respect to their processing conditions. The potentials of these advanced thin film technologies for THP applications have been finally analyzed, addressing their remaining issues upon scaling-up toward industrializations.