Experiments and computer simulation of submicron image formation by direct V U V photoetching

Authors :: L. V. Velikov
A. S. Kramarenko
G S Volkov
A. I. Maslakov
K. A. Valiev
Source :: Microelectronic Engineering. 3:339-347
Publication Year :: 1985
Publisher :: Elsevier BV, 1985.

Subjects :: Image formation
Materials science
Optics
business.industry
Electrical and Electronic Engineering
Condensed Matter Physics
business
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

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