Optimal Design of Narrow Line‐Width Front Contact Grid Pattern for Silicon Solar Cells and Low‐Cost Fabrication of Electroless Nickel Plated Imprint Lithography Hard Stamp

Authors :: Biji Pullithadathil
Appu Vengattoor Raghu
Karthikeyan K. Karuppanan
Balachander Krishnan
Mahaboobbatcha Aleem
Nijil Satheesan
Source :: Advanced Engineering Materials. 21:1900734
Publication Year :: 2019
Publisher :: Wiley, 2019.

Subjects :: Optimal design
Materials science
Fabrication
Silicon
business.industry
chemistry.chemical_element
Condensed Matter Physics
Line width
Nanoimprint lithography
law.invention
Electroless nickel
chemistry
law
Optoelectronics
General Materials Science
business
Lithography
Front (military)

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