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Slight Etching of Silicon to Control Post-RIE Damage
- Source :
- Proceedings of 1st International Symposium on Plasma Process-Induced Damage.
- Publication Year :
- 2005
- Publisher :
- IEEE, 2005.
Details
- Database :
- OpenAIRE
- Journal :
- Proceedings of 1st International Symposium on Plasma Process-Induced Damage
- Accession number :
- edsair.doi...........9dea2cede9b3d7e43b5b763b552b73b7
- Full Text :
- https://doi.org/10.1109/ppid.1996.715222