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Slight Etching of Silicon to Control Post-RIE Damage

Authors :
K. Torek
J. Ruzyllo
D.K. Hwang
Source :
Proceedings of 1st International Symposium on Plasma Process-Induced Damage.
Publication Year :
2005
Publisher :
IEEE, 2005.

Details

Database :
OpenAIRE
Journal :
Proceedings of 1st International Symposium on Plasma Process-Induced Damage
Accession number :
edsair.doi...........9dea2cede9b3d7e43b5b763b552b73b7
Full Text :
https://doi.org/10.1109/ppid.1996.715222