Plasma-assisted deposition techniques for hard coatings

This paper reviews the most commonly used deposition techniques for hard coatings, namely Plasma-Assisted Chemical Vapor Deposition (PACVD), Reactive Sputtering (RS) and Activated Reactive Sputtering (ARE). The role of plasma parameters and process parameters as well as their interdependency is discussed in terms of the three steps in deposition of films, i.e. generation of the depositing species, transport from source to substrate and film growth on the substrate.