Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices

MLA

Y.Y. Wang, and J. Bruley. “Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices.” Microscopy and Microanalysis, vol. 20, Aug. 2014, pp. 240–41. EBSCOhost, https://doi.org/10.1017/s143192761400292x.

APA

Y.Y. Wang, & J. Bruley. (2014). Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices. Microscopy and Microanalysis, 20, 240–241. https://doi.org/10.1017/s143192761400292x

Chicago

Y.Y. Wang, and J. Bruley. 2014. “Dual Lens Electron Holography for High Spatial Resolution Junction and Strain Mapping of Semiconductor Devices.” Microscopy and Microanalysis 20 (August): 240–41. doi:10.1017/s143192761400292x.