AlGaAs/GaAs Heterojunction Bipolar Transistors on Si substrate using epitaxial lift-off

Epitaxial lift-off (ELO) technique was used for the first time to transplant AlGaAs/GaAs Heterojunction Bipolar Transistors (HBT's) to Si substrates. Both preprocessed (devices processed before transplantation) and postprocessed (devices processed after transplantation) ELO HBT's on Si were demonstrated in this study. The characteristics of those HBT's on Si with either technique show nearly identical characteristics of the HBT's on GaAs without transplantation, indicating the film quality is maintained after transplantation. Devices with a high current gain of 550 were transplanted without any degradation, and the current gain is not limited by the ELO process. This current gain value is the highest reported for GaAs HBT's on Si with any techniques. >