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Impact of Schottky Barrier on the Performance of Two-Dimensional Material Transistors
- Source :
- 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
- Publication Year :
- 2020
- Publisher :
- IEEE, 2020.
-
Abstract
- Double-gated monolayer two-dimensional (2D) material transistor is expected to offer ideal (~60 mV/dec) subthreshold swing (SS) for gate lengths well below 10 nm. However, the ideal 2D transistor assumes Ohmic contacts whereas a realistic metal/2D Schottky contact can degrade SS. Transport simulations including scattering is necessary to correctly describe carrier thermalization and predict the SS degradation. Scaled 2D transistors with a Schottky barrier height (SBH) smaller than 100 meV and doping concentration in the extension region larger than 2x1013 cm-2 are required to achieve high performance.
- Subjects :
- 010302 applied physics
Materials science
Scattering
business.industry
Schottky barrier
Transistor
Doping
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
law.invention
Thermalisation
law
0103 physical sciences
Monolayer
Optoelectronics
Degradation (geology)
0210 nano-technology
business
Ohmic contact
Subjects
Details
- Database :
- OpenAIRE
- Journal :
- 2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
- Accession number :
- edsair.doi...........9a35a05daba51c4b3d7b6e43793df7a5