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Impact of Schottky Barrier on the Performance of Two-Dimensional Material Transistors

Authors :
Sheng-Kai Su
Jin Cai
Lain-Jong Li
Edward Chen
H.-S. Philip Wong
Source :
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD).
Publication Year :
2020
Publisher :
IEEE, 2020.

Abstract

Double-gated monolayer two-dimensional (2D) material transistor is expected to offer ideal (~60 mV/dec) subthreshold swing (SS) for gate lengths well below 10 nm. However, the ideal 2D transistor assumes Ohmic contacts whereas a realistic metal/2D Schottky contact can degrade SS. Transport simulations including scattering is necessary to correctly describe carrier thermalization and predict the SS degradation. Scaled 2D transistors with a Schottky barrier height (SBH) smaller than 100 meV and doping concentration in the extension region larger than 2x1013 cm-2 are required to achieve high performance.

Details

Database :
OpenAIRE
Journal :
2020 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD)
Accession number :
edsair.doi...........9a35a05daba51c4b3d7b6e43793df7a5