Back to Search Start Over

Spatial Redistribution of Oxygen Ions in Oxide Resistance Switching Device after Forming Process

Authors :
Yoshinobu Nakamura
Yoshiaki Suzuki
Kouji Taniguchi
Aiko Nakao
Kentaro Kojima
Tomohiro Kobayashi
Takeshi Yajima
Hidenori Takagi
Kohei Fujiwara
Toshiyuki Tanaka
Mai Takeda
Kei Sunouchi
Source :
Japanese Journal of Applied Physics. 49:060215
Publication Year :
2010
Publisher :
IOP Publishing, 2010.

Abstract

The change in the spatial distribution of oxygen ions after an initial voltage application called the forming process was investigated for oxide resistance switching devices by secondary ion mass spectrometry mapping. To track the motion of oxygen ions, tracer 18O ions were implanted in a planar Pt/CuO/Pt device. We found clear evidence for the oxygen reduction in the conductive bridge structure formed between two electrodes. In addition, the oxygen ions in the bridge structure drift to the anode, implying the oxygen diffusion (migration) induced by high electric field and/or current density. We discuss those results in terms of a filament model.

Details

ISSN :
13474065 and 00214922
Volume :
49
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........99458c44f74b55268cf022dd9cd2971e