Comparing RTA and Laser SPE & LPE Annealing of Ge-epi with Si, Sn & C Implantation for Well Mobility/Strain Engineering

Authors :: Gary Goodman
Shang-Shuin Chaung
Bulent M. Basol
Temel Buyuklimanli
Tseung-Yuen Tseng
John Borland
Nadya Khapochkina
Takashi Kuroi
Yao-Jen Lee
Abhijeet Joshi
Source :: 2019 19th International Workshop on Junction Technology (IWJT).
Publication Year :: 2019
Publisher :: IEEE, 2019.
Abstract: For undoped

Subjects :: Electron mobility
Materials science
Strain engineering
law
Annealing (metallurgy)
Doping
Analytical chemistry
Wafer
Laser
law.invention

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