Deposition and characterization of CVD – MoO3 thin films

This paper presents results on molybdenum oxide films deposited by APCVD process from Mo(CO) 6 in a low-temperature range - 125-200°C. We first study the correlation between CVD-process growth parameters and the structure of MoO 3 films, from one side, and the relation between their structure and optical properties, from the other side. We present a study basically on the influence on the structure of the temperature - the deposition and the post-deposition annealing ones and the influence of the vapor pressure of Mo(CO) 6 . The structure of the films is studied by different methods including infrared spectroscopy. The purpose is to see what kind of additional information can supply the IR measurements on the structure of the films in dependence of the CVD-process parameters.