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Nanoindentation characterization of thin film stack structures by finite element analysis and experiments using acoustic emission testing

Authors :
Chen Liu
Oliver Nagler
Florian Tremmel
Marianne Unterreitmeier
Jessica J. Frick
X. Wendy Gu
Debbie G. Senesky
Source :
Materials Science in Semiconductor Processing. 147:106737
Publication Year :
2022
Publisher :
Elsevier BV, 2022.

Details

ISSN :
13698001
Volume :
147
Database :
OpenAIRE
Journal :
Materials Science in Semiconductor Processing
Accession number :
edsair.doi...........956712f2d0e964a966b330eaa51ab0ea
Full Text :
https://doi.org/10.1016/j.mssp.2022.106737