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Characterization of Nano-Floating Gate Memory with ZnO Nanoparticles Embedded in Polymeric Matrix
- Source :
- Japanese Journal of Applied Physics. 45:7209-7212
- Publication Year :
- 2006
- Publisher :
- IOP Publishing, 2006.
-
Abstract
- Metal oxide nanoparticles are embedded in a polyimide matrix by a chemical reaction between a metal thin film and polyamic acid. The electrical characteristics of ZnO nanoparticles are investigated with a floating gate capacitor structure by capacitance–voltage (C–V) measurement. The C–V characteristics resulting from metal deposition modulation and the existence of a SiO2 layer are also investigated. As a result, ZnO particles with a SiO2 tunneling barrier show a C–V hysteresis voltage gap of 2.8 V at 300 K. ZnO particles directly located on a Si substrate show a C–V hysteresis width of 1.5 V at 80 K. This electrical characterization is discussed for applications to nano floating-gate memory devices.
Details
- ISSN :
- 13474065 and 00214922
- Volume :
- 45
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........94d5386ca7a95596c8b19349138011c2