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Profile formation and sustainment of autonomous tokamak plasma with current hole configuration
- Source :
- Nuclear Fusion. 45:933-941
- Publication Year :
- 2005
- Publisher :
- IOP Publishing, 2005.
-
Abstract
- We have investigated the profile formation and sustainment of tokamak plasmas with the current hole (CH) configuration by using 1.5 dimensional time-dependent transport simulations. A model of the current limit inside the CH on the basis of the Axisymmetric Tri-Magnetic-Islands equilibrium is introduced into the transport simulation. We found that a transport model with the sharp reduction of anomalous transport in the reversed-shear (RS) region can reproduce the time evolution of profiles observed in JT-60U experiments. The transport becomes neoclassical-level in the RS region, which results in the formation of profiles with internal transport barrier (ITB) and CH. The CH plasma has an autonomous property because of the strong interaction between a pressure profile and a current profile through the large bootstrap current. The ITB width determined by the neoclassical-level transport agrees well with that measured in JT-60U. The energy confinement inside the ITB agrees with the scaling based on the JT-60U data. The scaling means that the core plasma inside ITB is governed by the MHD equilibrium limit, i.e. the autonomous limitation of energy confinement in the CH plasma. The plasma with the large CH is sustained with the full current drive by the bootstrap current. The plasma with the small CH and the small bootstrap current fraction shrinks due to the penetration of inductive current. This shrink is prevented and the CH size can be controlled by the appropriate external current drive (CD). The CH plasma is found to respond autonomically to the external CD. The application of the CH plasma to the tokamak reactor is discussed.
Details
- ISSN :
- 17414326 and 00295515
- Volume :
- 45
- Database :
- OpenAIRE
- Journal :
- Nuclear Fusion
- Accession number :
- edsair.doi...........9488d061469709cafeec5fd46defc4b5
- Full Text :
- https://doi.org/10.1088/0029-5515/45/8/022