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Hopping conduction distance dependent activation energy characteristics of Zn:SiO2 resistance random access memory devices

Authors :
Cheng-Wei Tung
Ting-Chang Chang
Rui Zhang
Kuan-Chang Chang
Kai-Huang Chen
Tai-Fa Young
Yong-En Syu
Jung-Hui Chen
Tsung-Ming Tsai
Chih-Cheng Shih
Simon M. Sze
J. C. Lou
Source :
Applied Physics Letters. 102:133503
Publication Year :
2013
Publisher :
AIP Publishing, 2013.

Abstract

In this study, the hopping conduction distance variation of Zn:SiO2 resistance random access memory (RRAM) devices with different operating compliance currents was discussed and verified. To investigate and determine the hopping conduction distance dependent activation energy characteristics, the Arrhenius plot of low resistance state of Zn:SiO2 RRAM devices was applied, from which we proposed carrier conduction model. With the increase of current compliance, more metal ions would accumulate to form precipitates with larger diameter, which in turn resulted in the shortening of hopping distance. Because of shorter hopping distance, activation energy for carrier hopping would decrease.

Details

ISSN :
10773118 and 00036951
Volume :
102
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........9398678fc4e5a429ca3efdaba355547c
Full Text :
https://doi.org/10.1063/1.4799655