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Influence of Cu substrate topography on the growth morphology of chemical vapour deposited graphene
- Source :
- Carbon. 65:7-12
- Publication Year :
- 2013
- Publisher :
- Elsevier BV, 2013.
-
Abstract
- Raman spectroscopic maps were used to study the local properties of graphene films as grown on corrugated copper foils, by chemical vapour deposition, and after transfer onto SiO2(300 nm)/Si substrates. Analysis of the Raman peaks show the films exhibit a striped periodic pattern of single- and bi-layer graphene. By performing simultaneous AFM–Raman line maps of the as grown film on Cu we find that the layer growth shows a strong correlation to substrate topography. As a result, compressively strained non-AB stacked bi-layer graphene forms preferentially along the ridges, whilst single-layer graphene grows inside the trenches, of the Cu foil topography. These experimental results suggest that surface mobility is not the dominating factor determining control of layer number in such growth regimes.
- Subjects :
- Materials science
Morphology (linguistics)
Graphene
chemistry.chemical_element
Nanotechnology
General Chemistry
Substrate (electronics)
Chemical vapor deposition
Copper
law.invention
symbols.namesake
chemistry
law
Chemical physics
symbols
General Materials Science
Raman spectroscopy
Layer (electronics)
FOIL method
Subjects
Details
- ISSN :
- 00086223
- Volume :
- 65
- Database :
- OpenAIRE
- Journal :
- Carbon
- Accession number :
- edsair.doi...........9308b3bf8dfb5c21c5132584e41dcbb4
- Full Text :
- https://doi.org/10.1016/j.carbon.2013.06.090