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Oscillatory behavior of the magnetoresistance versus Cu spacer thickness in UHV-grown Co / Cu(111) multilayers

Authors :
P. Veillet
J.P. Renard
C. Dupas
E. Vélu
K. Le Dang
D. Renard
E. Kolb
Source :
Journal of Magnetism and Magnetic Materials. 128:361-364
Publication Year :
1993
Publisher :
Elsevier BV, 1993.

Abstract

The magnetoresistance of Au 3 /Cu 0.3 / Co 1.2 /Cu t /Co 1.2 /Cu 0.3 /Au 25 (111) multilayers (the numbers indicate the thickness grown by evaporation in UHV has been investigated between 1.4 and 300 K. Byusing a stepped wedge-shaped middle Cu layer, eight different t values could be obtained in a single sample. The MR exhibits an oscillatory behaviour up to t = 3.4 nm with a period of 0.8–1 nm, which is consistent with the predictions of RKKY theory for oscillatory interlayer coupling across Cu(111).

Details

ISSN :
03048853
Volume :
128
Database :
OpenAIRE
Journal :
Journal of Magnetism and Magnetic Materials
Accession number :
edsair.doi...........92823251063cfa367a985e96ecb732a1
Full Text :
https://doi.org/10.1016/0304-8853(93)90481-g