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Oscillatory behavior of the magnetoresistance versus Cu spacer thickness in UHV-grown Co / Cu(111) multilayers
- Source :
- Journal of Magnetism and Magnetic Materials. 128:361-364
- Publication Year :
- 1993
- Publisher :
- Elsevier BV, 1993.
-
Abstract
- The magnetoresistance of Au 3 /Cu 0.3 / Co 1.2 /Cu t /Co 1.2 /Cu 0.3 /Au 25 (111) multilayers (the numbers indicate the thickness grown by evaporation in UHV has been investigated between 1.4 and 300 K. Byusing a stepped wedge-shaped middle Cu layer, eight different t values could be obtained in a single sample. The MR exhibits an oscillatory behaviour up to t = 3.4 nm with a period of 0.8–1 nm, which is consistent with the predictions of RKKY theory for oscillatory interlayer coupling across Cu(111).
Details
- ISSN :
- 03048853
- Volume :
- 128
- Database :
- OpenAIRE
- Journal :
- Journal of Magnetism and Magnetic Materials
- Accession number :
- edsair.doi...........92823251063cfa367a985e96ecb732a1
- Full Text :
- https://doi.org/10.1016/0304-8853(93)90481-g