AlGaN/GaN MISHEMTs With High-$\kappa \ \hbox{LaLuO}_{3}$ Gate Dielectric

A high-κ LaLuO3 (LLO) thin film is successfully incorporated into AlGaN/GaN metal-insulator-semiconductor high-electron-mobility transistors (MISHEMTs) as the gate dielectric. The LLO-AlGaN/GaN MISHEMTs fabricated with a planar process exhibit a high ION/IOFF of 109, a maximum drain current of 820 mA/mm at VGS = 3 V, a peak transconductance (Gm) of ~ 192 mS/mm, and a steep subthreshold slope (SS) of ~ 73 mV/dec.