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Ion flux nonuniformities in large-area high-frequency capacitive discharges

Authors :
Jean-Paul Booth
A. Perret
Ph. Auvray
Jean Guillon
Pascal Chabert
Jacques Jolly
Source :
Applied Physics Letters. 83:243-245
Publication Year :
2003
Publisher :
AIP Publishing, 2003.

Abstract

Strong nonuniformities of plasma production are expected in capacitive discharges if the excitation wavelength becomes comparable to the reactor size (standing-wave effect) and/or if the plasma skin depth becomes comparable to the plate separation (skin effect) [M. A. Lieberman et al., Plasma Sources Sci. Technol. 11, 283 (2002)]. Ion flux uniformity measurements were carried out in a large-area square (40 cm×40 cm) capacitive discharge driven at frequencies between 13.56 MHz and 81.36 MHz in argon gas at 150 mTorr. At 13.56 MHz, the ion flux was uniform to ±5%. At 60 MHz (and above) and at low rf power, the standing-wave effect was seen (maximum of the ion flux at the center), in good quantitative agreement with theory. At higher rf power, maxima of the ion flux were observed at the edges, due either to the skin effect or to other edge effects.

Details

ISSN :
10773118 and 00036951
Volume :
83
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........90e5b2000fc5eca8252fa8b2023c89d6