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An energy-dependent two-dimensional substrate current model for the simulation of submicrometer MOSFET's

Authors :
Al F. Tasch
T.J. Bordelon
V.M. Agostinelli
Christine M. Maziar
X.L. Wang
Choh-Fei Yeap
Source :
IEEE Electron Device Letters. 13:554-556
Publication Year :
1992
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 1992.

Abstract

A multicurrent contour, average-energy-based, substrate current model for silicon submicrometer NMOSFETs is presented as a significant improvement to the local-field model that is commonly used in modern drift-diffusion device simulators. The model is implemented as a post-processor by applying a one-dimensional energy conservation equation to many current contours in order to generate a two-dimensional representation of average energy and impact ionization rate which is integrated to calculate the substrate current. Comparisons of simulations and experimental I-V curves for both simple and LDD MOSFETs are presented. Outstanding agreement has been obtained over a wide range of bias conditions and channel lengths. >

Details

ISSN :
15580563 and 07413106
Volume :
13
Database :
OpenAIRE
Journal :
IEEE Electron Device Letters
Accession number :
edsair.doi...........8f6b6bfc7eacf3bfb5d73d8f2cbbd2f0
Full Text :
https://doi.org/10.1109/55.192837