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21.1: A 513-ppi FFS-Mode TFT-LCD using CAAC Oxide Semiconductor Fabricated by a 6-Mask Proces

Authors :
Kaneko Seiji
Jun Koyama
Chieko Misawa
Akio Yamashita
Hiroshi Matsukizono
Masahiro Katayama
Haruyuki Baba
Mika Jikumaru
Yoshiharu Hirakata
Daisuke Kubota
Naoki Ueda
Shunpei Yamazaki
Masaru Nakano
Koji Moriya
Takuya Matsuo
Kanzaki Yohsuke
Shigeyasu Mori
Yusuke Kubota
Source :
SID Symposium Digest of Technical Papers. 45:263-266
Publication Year :
2014
Publisher :
Wiley, 2014.

Abstract

A driving method which does not need planarity for high definition and enables low frequency driving was examined. Further, a 513-ppi FFS-mode liquid crystal display (LCD) panel with high aperture ratio was fabricated via a six-mask process, using a technique that combines an oxide semiconductor and an oxide conductor.

Details

ISSN :
0097966X
Volume :
45
Database :
OpenAIRE
Journal :
SID Symposium Digest of Technical Papers
Accession number :
edsair.doi...........8ebbbe4f296f492de4264bcd3f3829c3