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21.1: A 513-ppi FFS-Mode TFT-LCD using CAAC Oxide Semiconductor Fabricated by a 6-Mask Proces
- Source :
- SID Symposium Digest of Technical Papers. 45:263-266
- Publication Year :
- 2014
- Publisher :
- Wiley, 2014.
-
Abstract
- A driving method which does not need planarity for high definition and enables low frequency driving was examined. Further, a 513-ppi FFS-mode liquid crystal display (LCD) panel with high aperture ratio was fabricated via a six-mask process, using a technique that combines an oxide semiconductor and an oxide conductor.
Details
- ISSN :
- 0097966X
- Volume :
- 45
- Database :
- OpenAIRE
- Journal :
- SID Symposium Digest of Technical Papers
- Accession number :
- edsair.doi...........8ebbbe4f296f492de4264bcd3f3829c3