Laser machining of specially designed photopolymers: photochemical ablation mechanism

Photopolymers based on the triazeno chromophore group (-N=N-N{lt}) have been developed. The absorption properties can be tailored for a specific irradiation wavelength. The photochemical exothermic decomposition yields high energetic gaseous products which are not contaminating the surface. The polymer can be structured with high resolution. No debris has been found around the etched corners. Maximum ablation rates of about 3 micrometer/pulse were achieved due to the dynamic absorption behavior (bleaching during the pulse). No physical or chemical modifications of the polymer surface could be detected after irradiation at the tailored absorption wavelength, whereas irradiation at different wavelengths resulted in modified (physical and chemical) surfaces.