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Ion beam milling-induced damage in AlGaAs/GaAs/AlGaAs single quantum well

Authors :
G. D. Guth
George J. Przybylek
Moses T. Asom
V. Swaminathan
Source :
Electronics Letters. 27:2320
Publication Year :
1991
Publisher :
Institution of Engineering and Technology (IET), 1991.

Abstract

Ion beam milling-induced damage in a 500 A AlGaAs/40 A GaAs/500 A AlGaAs single quantum well structure was investigated using low temperature cathodoluminescence spectroscopy. The ion beam energy (500-1500 eV) dependence of luminescence intensity indicated that minimum damage is introduced at a beam energy of 500 eV. Most (80-85%) of the original luminescence intensity was recovered on annealing at 400 o C for 5 min

Details

ISSN :
00135194
Volume :
27
Database :
OpenAIRE
Journal :
Electronics Letters
Accession number :
edsair.doi...........8dc7296a25ed9d4ce95b2541514db977