Prototyped XY stages driving EB mastering for a high density optical recording

Authors :: Tatsundo Suzuki
Fumio Isshiki
Hajime Koyanagi
Sumio Hosaka
Keizo Katoh
Akira Arimoto
Mitsuhide Miyamoto
Tetsuya Nishida
Yasushi Miyauchi
Source :: Technical Digest. CLEO/Pacific Rim 2001. 4th Pacific Rim Conference on Lasers and Electro-Optics (Cat. No.01TH8557).
Publication Year :: 2002
Publisher :: IEEE, 2002.
Abstract: Prototyped XY-stages driving electron beam (EB) writing system is developed to research the possibility to write fine patterns. High density optical recording pattern with 25 Gbit/in/sup 2/ is demonstrated. It is also clear that EB writing (drawing) system has a potential to achieve a required fine pattern for 100 Gbit/in/sup 2/.

Subjects :: Interferometry
Optics
Materials science
Optical control
business.industry
Optical recording
Cathode ray
High density
business
Electron-beam lithography

Database :: OpenAIRE
Journal :: Technical Digest. CLEO/Pacific Rim 2001. 4th Pacific Rim Conference on Lasers and Electro-Optics (Cat. No.01TH8557)
Accession number :: edsair.doi...........8da589438107f79969b9463bdd2b9329
Full Text :: https://doi.org/10.1109/cleopr.2001.970781