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Resist shrink characterization methodology for more accurate CD metrology

Authors :
Mary A. Breton
Karen Petrillo
Jennifer Church
Luciana Meli
Jennifer Fullam
Stuart Sieg
Romain Lallement
Nelson M. Felix
Shimon Levi
Susan Zollinger
Felix Levitov
Sean Hand
Jason Osborne
Weijie Wang
Source :
Metrology, Inspection, and Process Control XXXVI.
Publication Year :
2022
Publisher :
SPIE, 2022.

Details

Database :
OpenAIRE
Journal :
Metrology, Inspection, and Process Control XXXVI
Accession number :
edsair.doi...........8c92deb71005e7569268d7156eb153bf

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