Research on some Key Mechanical Properties of Silicon Nitride Thin Films Deposited by PECVD

MLA

Jun Hui Lin, et al. “Research on Some Key Mechanical Properties of Silicon Nitride Thin Films Deposited by PECVD.” Applied Mechanics and Materials, vol. 742, Mar. 2015, pp. 773–77. EBSCOhost, https://doi.org/10.4028/www.scientific.net/amm.742.773.

APA

Jun Hui Lin, Xue Nan Zhao, Qun Feng Yang, Jun Qing Wang, Gaofeng Zheng, & Jian Yi Zheng. (2015). Research on some Key Mechanical Properties of Silicon Nitride Thin Films Deposited by PECVD. Applied Mechanics and Materials, 742, 773–777. https://doi.org/10.4028/www.scientific.net/amm.742.773

Chicago

Jun Hui Lin, Xue Nan Zhao, Qun Feng Yang, Jun Qing Wang, Gaofeng Zheng, and Jian Yi Zheng. 2015. “Research on Some Key Mechanical Properties of Silicon Nitride Thin Films Deposited by PECVD.” Applied Mechanics and Materials 742 (March): 773–77. doi:10.4028/www.scientific.net/amm.742.773.