The optical dielectric model of Cu2O thin film and its verification

The transmittance and reflectance of cuprous oxide (Cu2O) thin film deposited on quartz substrate were measured by a spectrophotometer. Use the optical dielectric model combining the Forouhi–Bloomer model with modified Drude model (FBM+MDM), the optical constants, as well as the thickness of Cu2O film were attained from its measured transmittance data. Moreover, by means of the TFCalc software, the reflectance and transmittance were calculated conversely from the optical constants (n, k) and the thickness of the Cu2O film. It was found that the calculated reflectance and transmittance were in good agreement with the measured ones. So the optical dielectric model, namely FBM+MDM, is suitable for Cu2O thin film.