Thermal stability of Al2O3/TiO2 stacks for boron emitter passivation on n-type silicon solar cells

Boron-diffused samples passivated by Al2O3/TiO2 stacks with different types of TiO2 were investigated. An emitter saturation current density of 11 × 10−15 A/cm2 was obtained for Al2O3/TiO2 passivated samples with symmetrical 100 Ω/sq. boron diffusion. The surface passivation of Al2O3/TiO2 stacks was strongly impacted by the temperature, gas, and sequence during two-step annealing. In addition, the saturation current density of the Al2O3/TiO2 stacks is influenced by the TiO2 layers with an O3 treatment. Enhanced passivation performance of the Al2O3/TiO2 stacks was achieved by a combination of appropriate TiO2 capping layer and post-annealing. The results of this study provide reliable criteria for the design of thermally-stable Al2O3/TiO2 stacks on high-efficiency silicon solar cells.