Investigation of the effect of long-range action by measuring the Kikuchi line width

Authors :: G. P. Pokhil
E. A. Pitirimova
V. L. Levshunova
David Tetelbaum
V. V. Kozlovsky
Source :: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 8:1165-1167
Publication Year :: 2014
Publisher :: Pleiades Publishing Ltd, 2014.
Abstract: The variation in Kikuchi line widths upon the illumination of a silicon plate is studied with the help of an electronograph. This work attempts to observe the changes in the defect structure of the subsurface layer of silicon crystal due to the effect of long-range action. The mechanism of this effect is discussed.

Subjects :: Monocrystalline silicon
Range (particle radiation)
Optics
Silicon
Chemistry
business.industry
chemistry.chemical_element
Thin film
business
Kikuchi line
Action (physics)
Surfaces, Coatings and Films

ISSN :: 18197094 and 10274510
Volume :: 8
Database :: OpenAIRE
Journal :: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
Accession number :: edsair.doi...........8bbea0daf0db40bf368946f8cab80cf4
Full Text :: https://doi.org/10.1134/s1027451014060081

Full Text Access

Tools