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Insight into Effects of Oxygen Reservoir Layer and Operation Schemes on Data Retention of HfO2-Based RRAM
- Source :
- IEEE Transactions on Electron Devices. 66:3822-3827
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2019.
-
Abstract
- As a promising new generation of nonvolatile memory, HfO2-based resistive random-access memory (RRAM) has attracted extensive research. However, the problem of data retention has prevented its industrial production as embedded memory. In this paper, from the microscopic understanding, a Monte Carlo simulator is developed to investigate the effects of an oxygen reservoir layer (ORL) on the resistance instability of HfO2-based RRAM. The evolution of conductive filaments (CF) during the retention degradation is visualized by our simulation considering the physical mechanisms of oxygen ions absorbed and released by the ORL. The simulation results are further validated with experiments to provide the prediction of retention performance of RRAMs with different ORLs and operation schemes.
- Subjects :
- 010302 applied physics
Imagination
Resistive touchscreen
Materials science
Chemical substance
business.industry
media_common.quotation_subject
Monte Carlo method
01 natural sciences
Electronic, Optical and Magnetic Materials
Resistive random-access memory
Non-volatile memory
0103 physical sciences
Optoelectronics
Electrical and Electronic Engineering
Data retention
business
Science, technology and society
media_common
Subjects
Details
- ISSN :
- 15579646 and 00189383
- Volume :
- 66
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Electron Devices
- Accession number :
- edsair.doi...........8adf659e1f9f497416c931e0e2fef78b