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High-quality carbon nanotubes production using plasma-chemistry deposition method
- Source :
- Molecular Crystals and Liquid Crystals. 415:133-140
- Publication Year :
- 2004
- Publisher :
- Informa UK Limited, 2004.
-
Abstract
- Catalyst assisted chemical vapor deposition(CVD)is one of the most viable routes in production of carbon nanotubes(CNTs), but purification and deposition in oriented position still remain an open question. This contribution presents a method to deposit high-quality nanotubes, using RF-plasma assisted CVD and catalytic decomposition of a ferrocene-toluene mixture in a quartz tube reactor. The most important phenomena that have been encountered are that the iron released from ferrocene play catalyst role only on a characteristic length, being removed after that by plasma etching. Raman spectroscopy and Transmission Electron Microscopy(TEM)characterized the obtained carbon structures.
- Subjects :
- inorganic chemicals
Materials science
Plasma etching
technology, industry, and agriculture
chemistry.chemical_element
Nanotechnology
General Chemistry
Chemical vapor deposition
Carbon nanotube
Condensed Matter Physics
law.invention
symbols.namesake
chemistry
Chemical engineering
law
symbols
Deposition (phase transition)
General Materials Science
Carbon nanotube supported catalyst
Raman spectroscopy
Plasma processing
Carbon
Subjects
Details
- ISSN :
- 15635287 and 15421406
- Volume :
- 415
- Database :
- OpenAIRE
- Journal :
- Molecular Crystals and Liquid Crystals
- Accession number :
- edsair.doi...........8a9fd2c0250c7dab6d4e3d148b449371
- Full Text :
- https://doi.org/10.1080/15421400490478506