Area‐Selective Atomic Layer Deposition of MoS 2 using Simultaneous Deposition and Etching Characteristics of MoCl 5

Subjects

Subjects :

Atomic layer deposition
Materials science
Chemical engineering
chemistry
Etching (microfabrication)
Aluminium
chemistry.chemical_element
General Materials Science
Condensed Matter Physics
Deposition (chemistry)

Details

ISSN :

18626270 and 18626254

Volume :

15

Database :

OpenAIRE

Journal :

physica status solidi (RRL) – Rapid Research Letters

Accession number :

edsair.doi...........8a73bab23af844af02119e0325ecb772

Full Text :

https://doi.org/10.1002/pssr.202000533