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Apparent critical layer thickness in ZnSe/GaAs (001) heterostructures and the role of finite experimental resolution
- Source :
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 34:051201
- Publication Year :
- 2016
- Publisher :
- American Vacuum Society, 2016.
-
Abstract
- The critical layer thickness hc for the onset of lattice relaxation has important implications for the design of pseudomorphic and metamorphic II–VI device structures on lattice-mismatched substrates. Several theoretical models have been developed for the critical layer thickness, including the well-known force-balance model of Matthews and Blakeslee [J. Cryst. Growth 27, 188 (1974)]. Experimentally measured critical layer thicknesses in ZnSe/GaAs (001) heterostructures are often at variance with one another as well as the Matthews and Blakeslee model. By assuming that the lattice relaxation is a fixed fraction of the equilibrium relaxation (constant γ/γeq), Fritz [Appl. Phys. Lett. 51, 1080 (1987)] has shown that the measured hc may be much larger than the equilibrium value when using a finite experimental resolution. However, the assumption of constant fractional relaxation is not applicable to any heterostructure exhibiting kinetically limited lattice relaxation. In order to reconcile the conflicting r...
- Subjects :
- 010302 applied physics
Critical layer
Materials science
Condensed matter physics
Process Chemistry and Technology
Zinc compounds
Theoretical models
Wide-bandgap semiconductor
Heterojunction
02 engineering and technology
021001 nanoscience & nanotechnology
01 natural sciences
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Gallium arsenide
chemistry.chemical_compound
chemistry
Lattice (order)
0103 physical sciences
Materials Chemistry
Stress relaxation
Electrical and Electronic Engineering
0210 nano-technology
Instrumentation
Subjects
Details
- ISSN :
- 21662754 and 21662746
- Volume :
- 34
- Database :
- OpenAIRE
- Journal :
- Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
- Accession number :
- edsair.doi...........896436a8c28799d53aa2928b7979d9de
- Full Text :
- https://doi.org/10.1116/1.4959155