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Plasma Reactivity and Plasma-Surface Interactions During Treatment of Toluene by a Dielectric Barrier Discharge

Authors :
Stéphane Pasquiers
J.-R. Vacher
C. Postel
L. Magne
F. Jorand
N. Blin-Simiand
Source :
Plasma Chemistry and Plasma Processing. 28:429-466
Publication Year :
2008
Publisher :
Springer Science and Business Media LLC, 2008.

Abstract

Toluene removal is investigated in filamentary plasmas produced in N2 and in N2/O2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350°C) is examined. Toluene is removed in N2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N2/O2. It increases when the temperature increases for N2 and N2/O2. Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH3, must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.

Details

ISSN :
15728986 and 02724324
Volume :
28
Database :
OpenAIRE
Journal :
Plasma Chemistry and Plasma Processing
Accession number :
edsair.doi...........8928b863b0bfaee7412434b423d53c08
Full Text :
https://doi.org/10.1007/s11090-008-9135-1