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Plasma Reactivity and Plasma-Surface Interactions During Treatment of Toluene by a Dielectric Barrier Discharge
- Source :
- Plasma Chemistry and Plasma Processing. 28:429-466
- Publication Year :
- 2008
- Publisher :
- Springer Science and Business Media LLC, 2008.
-
Abstract
- Toluene removal is investigated in filamentary plasmas produced in N2 and in N2/O2 mixtures by a pulse high voltage energised DBD. Influence of the oxygen percentage (lower than 10%) and of the temperature (lower than 350°C) is examined. Toluene is removed in N2 through collisions with electrons and nitrogen excited states. The removal efficiency is a few higher in N2/O2. It increases when the temperature increases for N2 and N2/O2. Both H- and O-atoms play an important role in toluene removal because H can readily recombine with O to form OH, which is much more reactive with toluene than O. H follows from dissociation of toluene and of hydrogenated by-products by electron collisions. Detection of cyanhidric acid, acetylene, formaldehyde, and methyl nitrate strengthens that dissociation processes, to produce H and CH3, must be taken into account in kinetic analysis. Formation and treatment of deposits are also analysed.
- Subjects :
- General Chemical Engineering
Formaldehyde
chemistry.chemical_element
General Chemistry
Dielectric barrier discharge
Condensed Matter Physics
Photochemistry
Toluene
Oxygen
Dissociation (chemistry)
Surfaces, Coatings and Films
chemistry.chemical_compound
chemistry
Acetylene
Hydroxyl radical
Methyl nitrate
Subjects
Details
- ISSN :
- 15728986 and 02724324
- Volume :
- 28
- Database :
- OpenAIRE
- Journal :
- Plasma Chemistry and Plasma Processing
- Accession number :
- edsair.doi...........8928b863b0bfaee7412434b423d53c08
- Full Text :
- https://doi.org/10.1007/s11090-008-9135-1