Preparation and Characterization of Copper Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate

MLA

Yoichiro Nakanishi, et al. “Preparation and Characterization of Copper Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate.” Journal of The Electrochemical Society, vol. 142, Jan. 1995, pp. 166–69. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........8818d073e2d5a1d69e818ca33ed24dcf&authtype=sso&custid=ns315887.

APA

Yoichiro Nakanishi, Yoshinori Hatanaka, Aleksander M. Wrobel, Toru Aoki, & Sunil Wickramanayaka. (1995). Preparation and Characterization of Copper Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate. Journal of The Electrochemical Society, 142, 166–169.

Chicago

Yoichiro Nakanishi, Yoshinori Hatanaka, Aleksander M. Wrobel, Toru Aoki, and Sunil Wickramanayaka. 1995. “Preparation and Characterization of Copper Films Deposited in Hydrogen Remote Plasma by Copper(II) Acetylacetonate.” Journal of The Electrochemical Society 142 (January): 166–69. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........8818d073e2d5a1d69e818ca33ed24dcf&authtype=sso&custid=ns315887.