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Sub 2 nm Thick Zirconium Doped Hafnium Oxide High-K Gate Dielectrics
- Source :
- ECS Meeting Abstracts. :548-548
- Publication Year :
- 2006
- Publisher :
- The Electrochemical Society, 2006.
-
Abstract
- not Available.
Details
- ISSN :
- 21512043
- Database :
- OpenAIRE
- Journal :
- ECS Meeting Abstracts
- Accession number :
- edsair.doi...........86d96effbd4c1930df2a51772e058111
- Full Text :
- https://doi.org/10.1149/ma2005-02/13/548