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Contact Resistance of Microbumps in a Typical Through-Silicon-Via Structure

Authors :
Tom Ni
Chia-Liang Teng
Ben-Je Lwo
Kun-Fu Tseng
Shirley Lu
Source :
IEEE Transactions on Components, Packaging and Manufacturing Technology. 7:27-32
Publication Year :
2017
Publisher :
Institute of Electrical and Electronics Engineers (IEEE), 2017.

Abstract

The contact resistance of microbumps in a plastic ball grid array packaging with a through-silicon-via (TSV) structure was characterized. Accordingly, a self-designed TSV daisy-chain circuit was proposed to facilitate the formulation of the measurement paths, and the test samples were made by using a commercialized packaging process to simulate real product behaviors. Using the proposed single model and the complete model for the testing structure, about 25 $\text{m}\Omega $ was measured as the average contact resistance per microbump, and the contact resistance for each microbump was separately extracted between 4 and 60 $\text{m}\Omega $ In addition, decreasing contact resistance due to the annealing effect was observed from two different reliability tests.

Details

ISSN :
21563985 and 21563950
Volume :
7
Database :
OpenAIRE
Journal :
IEEE Transactions on Components, Packaging and Manufacturing Technology
Accession number :
edsair.doi...........8679669ab389f747a1f1974951f65a01
Full Text :
https://doi.org/10.1109/tcpmt.2016.2627577