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Contact Resistance of Microbumps in a Typical Through-Silicon-Via Structure
- Source :
- IEEE Transactions on Components, Packaging and Manufacturing Technology. 7:27-32
- Publication Year :
- 2017
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2017.
-
Abstract
- The contact resistance of microbumps in a plastic ball grid array packaging with a through-silicon-via (TSV) structure was characterized. Accordingly, a self-designed TSV daisy-chain circuit was proposed to facilitate the formulation of the measurement paths, and the test samples were made by using a commercialized packaging process to simulate real product behaviors. Using the proposed single model and the complete model for the testing structure, about 25 $\text{m}\Omega $ was measured as the average contact resistance per microbump, and the contact resistance for each microbump was separately extracted between 4 and 60 $\text{m}\Omega $ In addition, decreasing contact resistance due to the annealing effect was observed from two different reliability tests.
- Subjects :
- Single model
Materials science
Through-silicon via
Annealing (metallurgy)
Ball grid array
Contact resistance
Electronic engineering
Electrical and Electronic Engineering
Composite material
Temperature measurement
Omega
Industrial and Manufacturing Engineering
Electronic, Optical and Magnetic Materials
Subjects
Details
- ISSN :
- 21563985 and 21563950
- Volume :
- 7
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Components, Packaging and Manufacturing Technology
- Accession number :
- edsair.doi...........8679669ab389f747a1f1974951f65a01
- Full Text :
- https://doi.org/10.1109/tcpmt.2016.2627577