A novel nanoscale resist using 10-undecanoic acid monolayers on silicon dioxide

MLA

Michael N. Kozicki, et al. “A Novel Nanoscale Resist Using 10-Undecanoic Acid Monolayers on Silicon Dioxide.” Microelectronic Engineering, vol. 47, June 1999, pp. 239–41. EBSCOhost, https://doi.org/10.1016/s0167-9317(99)00204-x.

APA

Michael N. Kozicki, B. Kardynal, S. J. Yang, & T. Kim. (1999). A novel nanoscale resist using 10-undecanoic acid monolayers on silicon dioxide. Microelectronic Engineering, 47, 239–241. https://doi.org/10.1016/s0167-9317(99)00204-x

Chicago

Michael N. Kozicki, B. Kardynal, S. J. Yang, and T. Kim. 1999. “A Novel Nanoscale Resist Using 10-Undecanoic Acid Monolayers on Silicon Dioxide.” Microelectronic Engineering 47 (June): 239–41. doi:10.1016/s0167-9317(99)00204-x.