Magnetic antidot arrays using filled diblock copolymer micelles as ion etching mask

We present a simple method for the production of magnetic antidot arrays utilizing polystyrene-poly-2-vinylpyridine micelles filled with amorphous SiO 2 . By dip coating, a micellar monolayer is deposited onto Co/Pt multilayers. A hexagonal pattern with periodicity of 80 nm is obtained. By Ar + ion etching the micelle layer is transformed into an antidot array due to preferred sputtering of the SiO 2 core. Further ion bombardment transfers the pattern into the magnetic film and leads to a reorientation of the perpendicular to in-plane easy axis which is attributed to intermixing of the Co/Pt multilayers.