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Chemical Vapor Deposition Enhanced by Atmospheric Pressure Non-thermal Non-equilibrium Plasmas

Authors :
Michael L. Hitchman
S. E. Alexandrov
Source :
Chemical Vapor Deposition. 11:457-468
Publication Year :
2005
Publisher :
Wiley, 2005.

Abstract

This review gives an overview of the characteristics of various non-thermal, non-equilibrium plasmas and discusses applications of AP-PECVD with dielectric barrier discharges, corona discharges, RF discharges, and microwave discharges.

Subjects

Subjects :
Atmospheric pressure
Chemistry
Process Chemistry and Technology
Analytical chemistry
Surfaces and Interfaces
General Chemistry
Plasma
Dielectric
Chemical vapor deposition
Corona
Plasma-enhanced chemical vapor deposition
Atomic physics
Microwave
Corona discharge

Details

ISSN :
15213862 and 09481907
Volume :
11
Database :
OpenAIRE
Journal :
Chemical Vapor Deposition
Accession number :
edsair.doi...........8126719bbc7aa44afe50a53a44c581e4
Full Text :
https://doi.org/10.1002/cvde.200500026
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