In Situ Observations of Stresses in Al Interconnect Line by Synchrotron Radiation under Thermal/Electrical Conditions

In-situ observation of stress in Al interconnects under electromigration and thermal effect by using the synchrotron radiation x-ray diffraction. The test temperature was controlled by changing the current density of W (self-heating structure). The EM-induced stress was also investigated with current densities from 3x105A/cm2 to 4x106A/cm2.The conclusion agreed well with the simulation results.