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Acceleration Factors for Thin Oxide Breakdown
- Source :
- Journal of The Electrochemical Society. 132:1903-1908
- Publication Year :
- 1985
- Publisher :
- The Electrochemical Society, 1985.
-
Abstract
- Analyse de donnees de disruption electrique en fonction du temps concernant des couches minces SiO 2 de 100 A d'epaisseur, en utilisant un modele d'Eyring
- Subjects :
- chemistry.chemical_classification
Materials science
Renewable Energy, Sustainability and the Environment
business.industry
Electric breakdown
Dielectric
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Acceleration
Optics
chemistry
Materials Chemistry
Electrochemistry
Thin film
Composite material
business
Thin oxide
Inorganic compound
Subjects
Details
- ISSN :
- 19457111 and 00134651
- Volume :
- 132
- Database :
- OpenAIRE
- Journal :
- Journal of The Electrochemical Society
- Accession number :
- edsair.doi...........804a6282069ffdad531b7e9a214d4e1b