Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Authors :: Tim Brunner
John C. Robinson
Gian Lorusso
Source :: Journal of Micro/Nanolithography, MEMS, and MOEMS. 17:1
Publication Year :: 2018
Publisher :: SPIE-Intl Soc Optical Eng, 2018.
Abstract: This guest editorial summarizes the Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

Subjects :: Materials science
Stochastic process
business.industry
Mechanical Engineering
Extreme ultraviolet lithography
Surface finish
Integrated circuit
Variance (accounting)
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
law.invention
Metrology
Optics
law
Electrical and Electronic Engineering
Photolithography
Photomask
business

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